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Christopher L Hinkle
Assistant Professor-Materials Science & Engineering, Department of Materials Science & Engineering
Office MailstopMail Box: RL10, Room No.: NSERL 4.712 
Email Address    Primary Phone Number 972-883-5711    Media Contact
 Professional Preparation
 PhPhysicsNorth Carolina State University 
 B.S.PhysicsNorth Carolina State University 
Collapse Section Expand Section Publications
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  YearPublication  Type
R. V. Galatage, H. Dong, D. M. Zhernokletov, B. Brennan, C. L. Hinkle, R. M. Wallace, and E. M. Vogel, "Electrical and chemical characteristics of Al2O3/InP metal-oxide-semiconductor capacitors," Applied Physics Letters 102, 132903 (2013).
Peer reviewed
A. M. Thron, T. J. Pennycook, J. Chan, W. Luo, A. Jain, D. Riley, J. Blatchford, J. B. Shaw, K. van Benthem, E. M. Vogel, C. L. Hinkle, K. van Benthem, "Formation of pre-silicide layers below Ni1-xPtxSi/Si interfaces," Acta Materialia 61, 2481 (2013).
Peer reviewed
B. Brennan, S. McDonnell, D. Zhernokletov, H. Dong, C. L. Hinkle, J. Kim, and R. M. Wallace, "In-situ studies of III-V surfaces and high-k atomic layer deposition," Solid State Phenomena 195, 90 (2013).
Peer reviewed
J. Chan, M. Balakchiev, A. M. Thron, R. A. Chapman, D. Riley, S. C. Song, A. Jain, J. Blatchford, J. B. Shaw, K. van Benthem, E. M. Vogel, C. L. Hinkle, "PtSi Dominated Schottky Barrier Heights of Ni(Pt)Si Contacts Due to Pt Segregation," Applied Physics Letters 102, 123507 (2013).
Peer reviewed
H. Dong, B. Brennan, D. Zhernokletov, J. Kim, C. L. Hinkle, and R. M. Wallace, "In situ Study of HfO2 Atomic Layer Deposition on InP (100)," Applied Physics Letters 102, 171602 (2013).
Peer reviewed
Collapse Section Expand Section Appointments
DurationRankDepartment / SchoolCollege / OfficeUniversity / Company
2009-presentAssistant ProfessorDepartment of Materials Science and Engineering University of Texas at Dallas
2008-2009Research ScientistDepartment of Electrical Engineering University of Texas at Dallas
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