The Professional Preparation section lists academic qualifications such as degrees and diplomas. Each record stores the degree, major, institution and year. The records can also be hidden from public view by checking the hide checkbox. Please click here for available slides.
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The primary focus of my research is on the plasmas used in semiconductor device manufacturing. The research is primarily experimental in nature although I have performed some plasma simulations and will be doing it more. In particular, my group is best known for our research into pulsed plasmas and ion-ion plasmas. Pulsed-plasmas have the plasma source turned on-and-off periodically, while ion-ion plasmas have only positive and negative ions in them and no electrons. Both have significant advantages over continuous electron-ion dominated plasmas. I and my students have developed several diagnostics for studying these plasmas and consequently have extensive experience in determining plasma kinetics. These projects have been supported by the NSF, DoE, State of Texas, and several companies. 2009 projects include work for SRC (Deep Si Etch), Photronics (Mask etch) and DoE (Micro-Misted plasmas).
The Publications section lists any and all publications worked on. Research Explorer's search engine indexes data in this field for keyword searches. The category field is a user defined field where any number of categories can be created by the user to categorize publications. For example, publications can be categorized by the Journal that they appear in. Please click here for available slides.
"Tuning of Fe catalysts for growth of spin-capable carbon nanotubes." J.-H. Kim, H.-S. Jang, K. H. Lee, L. J. Overzet, G. S. Lee, Carbon 48, 538-47 (2010).
"Transient effects caused by pulsed gas and liquid injections into low pressure plasmas." D. Ogawa, C. Chung, M. Goeckner and L. Overzet, Plasma Sources Sci. Technol. 19 034013 (2010) (11 pp.) Category: Plasma Sources Science and Technology
"Chemistry in long residence time fluorocarbon plasmas." S. P. Sant, C. T. Nelson, L. J. Overzet, and M. J. Goeckner, J. Vac. Sci. Technol. A 27, 193-208 (2009). Category: Journal of Vaccuum Science and Technology A
"Progress report: Direct injection of liquids into low-pressure plasmas." M. Goeckner, D. Ogawa, I. Saraf and L. Overzet, Journal of Physics: Conference Series 162, 012014 (2009) (9 pp.).
"Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model." S. P. Sant, C. T. Nelson, L. J. Overzet, and M. J. Goeckner, J. Vac. Sci. Technol. A 27, 631- 42 (2009).
Presentations and Projects
The Presentations and Projects section lists anything that does not fit in the publication category such as conferences, seminars, invited talks, etc. Research Explorer's search engine indexes data in this field for keyword searches. Please click here for available slides.
In-situ study of plasma-wall interactions in inductively coupled fluorocarbon plasma. "In-situ study of plasma-wall interactions in inductively coupled fluorocarbon plasma." L. Overzet, M. Goeckner, E. Joseph, B. Zhou and S. Sant, Dry Process Symposium, Jeju Island Korea, Nov. 2005.
Carbon nanotube (CNT) growth using an atmospheric pressure plasma jet process and initial device test
Plasma Science Research at UTD: From Fluorocarbons to CNTs "Plasma Science Research at UTD: From Fluorocarbons to CNTs." L. Overzet, M. Goeckner and G.-S. Lee. University of Orleans - GREMI seminar. Orleans, France May 2004
Direct injection of liquids into low pressure plasmas: Working towards the synthesis of nanostructured composites. "Direct injection of liquids into low pressure plasmas: Working towards the synthesis of nanostructured composites." L. Overzet, M. Goeckner, D. Ogawa, I Saraf, R. Timmons and S. Sanchez. SPRING IV Conference, U. Houston, Houston TX Feb. 2007.
"Oct. 22, 2006"
"Oct. 25, 2006"
Filling of Carbon Nanotube Forests Grown by Atmospheric Pressure PECVD
The Appointments section lists work experience including previous appointments. Research Explorer's search engine indexes data in this field for keyword searches. Please click here for available slides.
The Additional Information section describes any other topics you wish to display on your profile that is not in another section. Research Explorer's search engine indexes data in this field for keyword searches. Please click here for available slides.
Consultant on Plasma Based Semiconductor Cleaning Technologies and Liaison to the Sandia National Laboratories CRADA Team, Sept.-Dec. 1999, Beta Squared Incorporated, Allen TX.
High Density Plasma Source for Semiconductor Processing. # 6,028,285.
Plasma Apparatus for Ion Energy Control. # 6,097,157.
Transmission Line Based Inductively Coupled Plasma Source with Stable Impedance. # 6,459,066
Particle Contamination Cleaning from Substrates Using Plasmas, Reactive Gases, and Mechanical Agitation. #6,676,800.
Ion-Ion Plasma Processing with Bias Modulation Synchronized to Time-Modulated Discharges. #6,875,700
Honors and Awards
Honorary Member in the Golden Key International Honour Society (10/07).
Polykarp Kusch Lecturer for UTD 2005.
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